Photo lithography systems

MicroWriter from Durham Magneto Optics (DMO)

The MicroWriter 3 is a direct-write photo lithography system. It is flexible and powerful and offers everything you need for high resolution combined with fast processing.

MicroWriter Baby is the smallest optical lithography machine in the world and is offered at an affordable price.

Features
High resolution
Fast writing speed
Easy-to-use
Cost effective
Flexible configuration

The MicroWriter 3 works with a 385 nm photo diode which can be used for g-, h- and i-line resists (positive and negative and SU-8). The system provides four different resolutions which easily can be switched via the software (0.6 µm, 1 µm, 2 µm and 5 µm). MicroWriter 3 includes an optical profilometer and a wafer inspection tool.

Additionally one can add a 405 nm photo diode or the backside alignment option to the system.

The baby, the baby plus and the Mesa system are using a 405 nm diode as standard which can be change with a 385 nm.

Each system can be upgraded to the next level at any later stage which makes the MicroWriter family the most flexible direct write lithography platform in the market.

Microwriter SpecificationML3 BabyML3 Baby PlusML3 MesaML3
Maximum substrate size [mm]155 x 155 x 7155 x 155 x 7155 x 155 x 7230 x 230 x 15
Maximum writing area [mm]149 x 149149 x 149149 x 149195 x 195
Exposure resolutions [µm]11 and 50.6, 1, 2, 50.6, 1, 2, 5
Surface tracking autofocus systemYesYesYesYes
Greyscale lithographyYesYesYesYes
Alignment microscope objectivesx10x3 and x10x3, x10, x20x3, x5, x10, x20
Automatic lens changer for exposure resolution and alignment microscopeNoYesYesYes
Backside alignmentNoNoNoAvailable as option
Exposure wavelength [nm]405, 385 as option 405, 385 as option405, 385 as option385
Maximum writing speed20 mm2/minute at 1 µm 20 mm2/minute at 1 µm 120 mm2/minute at 5 µm10 mm2/minute at 0.6 μm,20 mm2/minute at 1 μm 120 mm2/minute at 5 μm20 mm2/minute at 0,6 µm, 50 mm2/minute at 1 µm, 100 mm2/minute at 2 µm , 180 mm2/minute at 5 µm
Overlay alignment accuracy at best resolution [µm]±2 ±1±1±0,5
Minimum addressable grid [nm]200200100100
Motion stage minimum XY step size [nm]20202020
Optical surface profiler Z resolution [nm]not applicalble200200100
Automatic wafer inspection toolNoYesYesYes
Virtual mask aligner toolNoAvailable as optionAvailable as optionYes
Temperature stabilized enclosureNoNoNoYes
Supplied with vibration isolating optical tableNoNoNoYes
Mask design softwareOpen source KLayout supplied. Clewin available as optionOpen source KLayout supplied. Clewin available as optionOpen source KLayout supplied. Clewin available as optionClewin supplied
Can be upgraded?YesYesYesNo
Microelectronics and semiconductors
Spintronics
MEMS / NEMS
Sensors
Microfluidics and lab-on-a-chip
Nanotechnology
Materials science
Graphene and other 2-dimensional materials
Loading and exposing a sample

Video: loading and exposing a sample

Developing and viewing a sample

Video: developing and viewing a sample

Contacts

Request further information
Sales Manager
+34 937 349168
Fax: +34 937 349168

Our partner

Follow us: twitter linkedin
European offices
© LOT Quantum Design 2016